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Electric field modified Arrhenius description of charge transport in amorphous oxide semiconductor thin film transistors

机译:电场修改Arhenius在非晶氧化物半导体薄膜晶体管中的电荷输送描述

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摘要

While it is known that the charge-carrier mobility in amorphous metal oxide semiconductor thin film transistors (TFT) deviates from Arrhenius temperature dependence, we found that the Hall mobility measured in amorphous In-Ga-Zn-O (a-IGZO) follows an Arrhenius relation surprisingly well.We explain these observations by the effect of strong vertical electric field created by the gate voltage, which facilitates direct tunneling of trapped carriers into the conductive band and leads to virtually temperature independent mobility. We present a generalized Arrhenius model based on the effective temperature concept. We show that our model allows quantitative description of the temperature dependence of the mobility in a-IGZO TFTs over a broad temperature range.
机译:虽然已知无定形金属氧化物半导体薄膜晶体管(TFT)中的电荷载流子迁移率偏离Arhenius温度依赖性,但我们发现在无定形In-Zn-O(A-IgZo)中测量的霍尔迁移率遵循 Arrhenius对令人惊讶的是。我们通过栅极电压产生的强垂直电场的效果来解释这些观察,这便于将被困载体的直接隧穿进入导电带并导致几乎温度的无关移动性。 我们提出了一种基于有效温度概念的广义arrhenius模型。 我们表明,我们的模型允许在宽温度范围内定量描述迁移率在A-IGZO TFT中的温度依赖性。

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  • 来源
    《Physical review, B》 |2018年第24期|共5页
  • 作者单位

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Department of Information Display Advanced Display Research Center Kyung Hee University Korea;

    Key Laboratory of Wide Band Gap Semiconductor Materials and Devices Xidian University China;

    Department of Information Display Advanced Display Research Center Kyung Hee University Korea;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    State Key Laboratory of Magnetism Institute of Physics of Chinese Academy of Sciences Beijing 100029 China;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

    Institute of Physics National Academy of Sciences of Ukraine Prospect Nauky 46 03028 Kyiv Ukraine;

    Department of Information Display Advanced Display Research Center Kyung Hee University Korea;

    Key Laboratory of Microelectronic Devices &

    Integrated Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 固体物理学;
  • 关键词

    Electric; field; modified;

    机译:电气;现场;修改;

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