首页> 外文期刊>Physical review, B >Counterflowing edge current and its equilibration in quantum Hall devices with sharp edge potential: Roles of incompressible strips and contact configuration
【24h】

Counterflowing edge current and its equilibration in quantum Hall devices with sharp edge potential: Roles of incompressible strips and contact configuration

机译:具有尖锐边缘电位量子霍尔器件的逆流电流及其平衡:不可压缩条带的角色和接触配置

获取原文
获取原文并翻译 | 示例
           

摘要

We report the observation of counterflowing edge current in InAs quantum wells which leads to the breakdown of quantum Hall (QH) effects at high magnetic fields. Counterflowing edge channels arise from the Fermi-level pinning of InAs and the resultant sharp edge potential with downward bending. By measuring the counterflow conductance for varying edge lengths, we determine the effective number N-C of counterflowing modes and their equilibration length lambda(eq) at a bulk integer filling factor nu = 1-4 lambda(eq) increased exponentially with magnetic field B, reaching 200 mu m for nu = 4 at B >= 7.6 T. Our data reveal important roles of the innermost incompressible strip with even filling in determining N-C and lambda(eq) and the impact of the contact configuration on the QH effect breakdown. Our results show that counterflowing edge channels manifest as transport anomalies only at high fields and in short edges. This in turn suggests that, even in the integer QH regime, the actual microscopic structure of the edge states can differ from that anticipated from macroscopic transport measurements, which is relevant to various systems including atomic-layer materials.
机译:我们报告中的InAs量子阱导致量子霍尔(QH)在高磁场效应的击穿逆流边电流的观察。逆流边缘通道从砷化铟的费米能级钉扎,并与向下弯曲得到的尖锐边缘潜在出现。通过测量逆流电导用于改变边缘的长度,我们确定逆流模式的有效数量NC和在散装整数填充率NU = 1-4拉姆达(当量)其平衡长度拉姆达(当量)与磁场B成倍增加,达200亩在B M为NU = 4> = 7.6 T.我们的数据显示的最内不可压缩带的重要作用甚至在确定NC和拉姆达(当量)和所述接触结构上QH效果击穿的影响填充。我们的研究结果表明,逆流的边缘通道只有在高场和短边运输异常表现。这又表明,即使是在整数QH制度,边缘状态的实际微观结构可以由从宏观运输测量,这是相关的各种系统,包括原子层的材料的预期不同。

著录项

  • 来源
    《Physical review, B》 |2019年第12期|共7页
  • 作者单位

    NTT Corp NTT Basic Res Labs 3-1 Morinosato Wakamiya Atsugi Kanagawa 2430198 Japan;

    NTT Corp NTT Basic Res Labs 3-1 Morinosato Wakamiya Atsugi Kanagawa 2430198 Japan;

    NTT Corp NTT Basic Res Labs 3-1 Morinosato Wakamiya Atsugi Kanagawa 2430198 Japan;

    NTT Corp NTT Basic Res Labs 3-1 Morinosato Wakamiya Atsugi Kanagawa 2430198 Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 固体物理学;
  • 关键词

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号