Reaction of Silyl Hydrides with Tetrabutoxygermanium in the Presence of B(C6F5)(3): Difference between Silicon and Germanium Chemistries and Easy Route to GeH4

摘要

Dehydrocarbonative condensation reaction between alkoxysilanes and hydrosilanes catalyzed by tris(pentafluorophenyl)borane has been widely used for the formation of siloxane bonds. Our attempt to extend this chemistry to the preparation of Ge-O-Si bonds produced an unexpected outcome. The reaction of Ge(OBu)(4) with PhMe2SiH in the presence of a catalytic amount of B(C6F5)(3) at room temperature proceeded smoothly with the complete consumption of reactants and formation of Geti, and PhMe2SiOBu in high yields. For the first time we have achieved selective exchange of functional groups between Ge-OR and Si-H. The discovered reaction features simple reaction from conditions and can be used to prepare GeH4 in situ available and safe substrates.