首页> 外文期刊>Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic >1064nm nanosecond laser induced ring structure on SiO2 films with different thickness in air and vacuum environments
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1064nm nanosecond laser induced ring structure on SiO2 films with different thickness in air and vacuum environments

机译:1064NM纳秒激光诱导的SiO2薄膜在空气和真空环境中具有不同厚度的薄膜

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摘要

The ring structure induced by 1064 nm nanosecond laser on SiO2 films with different film thickness was investigated in air and vacuum environments. The damage depth and ring spacing versus the incident laser flux were analyzed. It is found that vacuum induced high defect density as a result of low defect damage threshold, compared with the air environment. And for the same laser fluence, the ring spacing was reduced while the damage depth was increased once the surrounding air was removed. Our research results also indicate that the defects logging in subsurface of coating layer, play a much more crucial role in the formation process of laser-induced ring structures.
机译:在空气和真空环境中研究了由1064nm纳秒激光器上的1064nm纳秒激光引起的环结构。 分析了损伤深度和环间距与入射激光通量相比。 结果发现,与空气环境相比,由于低缺陷损伤阈值而真空诱导的高缺陷密度。 对于相同的激光通量,在除去周围空气后,环间距减小,同时损坏深度增加。 我们的研究结果还表明,在涂层地下测井的缺陷,在激光诱导的环结构的形成过程中起着更重要的作用。

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