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Reliable passivation of black phosphorus by thin hybrid coating

机译:通过薄杂种涂层可靠地钝化黑磷

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Black phosphorus (BP) possesses several extraordinary physical properties, which include inplane anisotropy, thickness dependent direct bandgap and high carrier mobility. These physical properties make BP highly desirable from the point of view of fundamental science and modern optoelectronics applications. The excitement about this material has always been accompanied by unreserved skepticism due to its extraordinary degradation under ambient conditions. Here we show ambient degradation of exfoliated BP can be effectively suppressed using thin layer of hybrid metal organic chemical vapor deposition coating of boron nitride (BN) followed by atomic layer deposition coating of Al2O3. We have extensively studied the time dependent surface, optical and electrical properties of BP encapsulated by BN and/or Al2O3 using nanoscale infrared imaging and I-V characterizations. Our results show hybrid thin layer (similar to 5 nm) BN/Al2O3 coated BP exfoliated on SiO2 substrate is protected from degradation in ambient for over 6 months, much longer than those coated only by BN or Al2O3 layers. Our theoretical modeling of the experimental degradation growth pattern shows that the influence of neighboring elements on the degradation of a given element is minimal for BP flakes with hybrid coating. Electrical characterization further confirms the effectiveness of BN/Al2O3 as encapsulation layer and gate dielectrics with minor changes after several weeks.
机译:黑磷(BP)具有几种非凡的物理性质,包括浸入式各向异性,厚度依赖性直接带隙和高载流子移动性。这些物理属性从基本科学和现代光电子应用的角度来看,使BP非常可取。由于其在环境条件下,令人兴奋的兴奋始终伴随着未经安全的怀疑。在这里,我们表示使用氮化硼(BN)的薄膜混合金属有机化学气相沉积涂层,然后用Al 2 O 3的原子层沉积涂层有效地抑制Excoliated BP的环境降解。我们已经广泛地研究了使用纳米级红外成像和I-V型特征的BN和/或AL2O3封装的BP的时间依赖性表面,光学和电性能。我们的结果显示杂交薄层(类似于5nm)在SiO 2底物上剥离的Bn / Al2O3涂覆的BP免受环境温度的降解超过6个月,比仅由Bn或Al2O3层涂覆的那些。我们的实验性降解生长模式的理论建模表明,相邻元件对具有杂化涂层的BP薄片的对给定元素的降解的影响最小。电学表征进一步证实了BN / Al2O3作为封装层和栅极电介质的有效性,并且在几周后具有微小的变化。

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