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Interlayer diffusion of Au atoms in a heteroepitaxial system

机译:Au原子在异质外延体系中的层间扩散

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In heteroepitaxy, thin-film growth proceeds in two-dimensional layer-by-layer,three-dimensional island, or layer-plus-island modes depending on the growth conditions.Interlayer mass transport plays a crucial role in determining the growth mode. We investigate interlayer diffusion of Au atoms from Au islands grown on Ir(111) by scanning tunneling microscopy (STM) and kinetic Monte Carlo (KMC) simulations. STM measurements reveal that the first Au layer on Ir(111) grows in a complete layer at 100 K, whereas the Au layer grows in a three-dimensional fashion from the second Au layer at this temperature. Annealing these surfaces to 300 K reduces the higher-layer islands, indicating that Au atoms undergo step-down diffusion. By measuring the density of the top-layer islands and comparing them with the KMC simulation results, the additional step-down diffusion barrier for Au atoms to descend from the Au islands is estimated to be 0.02 eV on the first Au layer and 0.04 eV on the second Au layer. The layer dependence of the additional step-down diffusion barrier is explained in terms of the lattice mismatch between Au and underlying layers.
机译:在异质外延中,薄膜的生长以二维,逐层,三维岛或层加岛的模式进行,这取决于生长条件。层间传质在确定生长模式中起着至关重要的作用。我们通过扫描隧道显微镜(STM)和动力学蒙特卡洛(KMC)模拟研究了生长在Ir(111)上的Au岛上Au原子的层间扩散。 STM测量表明,在此温度下,Ir(111)上的第一Au层在100 K时以完整层的形式生长,而Au层则从第二Au层以三维方式生长。将这些表面退火至300 K会减少较高层的岛,这表明Au原子经历了降压扩散。通过测量顶层岛的密度并将其与KMC模拟结果进行比较,估计Au原子从Au岛下降的附加降压扩散势垒在第一Au层上为0.02 eV,在Au层上为0.04 eV。第二金层。根据Au和下层之间的晶格失配来解释附加降压扩散势垒的层依赖性。

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