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Effect of Si addition on the corrosion properties of amorphous Fe-based soft magnetic alloys

机译:硅的添加对非晶态铁基软磁合金腐蚀性能的影响

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摘要

Effects of an addition of Si and P into amorphous Fe_(85.2)B_(14)Cu_(0.8) based soft magnetic alloys were investigated in boric-borate buffer solution. The addition of P decreased the passive current density effectively. Substituting Si for P in Fe_(85.2)Si_xB_9P_5 - _xCu_(0.8) (x = 0, 1, 2 at.%) alloys further improved corrosion resistance. After the removal of the oxide films, the passive current density was higher than those covered by the oxide films. The lowest passive current density was observed at 5 × 10~(-6) A/cm~2 on the Fe_(85.2)Si_1B_9P_4Cu_(0.8) alloy. On the other hand, the pitting potential of the alloys before and after removal of the oxide films was as high as about 0.96 V and was independent of chemical composition of the alloys. The addition of Si and P could enhance the corrosion resistance of Fe_(85.2)Si_xB_9P_5 - _xCu_(0.8) alloys via modification of the chemical composition of the oxide films. Cyclic voltammetric results indicated that the addition of Si suppressed the formation rate of bivalent Fe species, which slows down reaction rates of this rate-determining step.
机译:在硼硼酸盐缓冲溶液中研究了向非晶态Fe_(85.2)B_(14)Cu_(0.8)基软磁合金中添加Si和P的影响。 P的添加有效地降低了无源电流密度。用Fe代替Fe_(85.2)Si_xB_9P_5-_xCu_(0.8)(x = 0,1,2 at。%)合金中的P可以进一步提高耐腐蚀性。在去除氧化膜之后,无源电流密度高于被氧化膜覆盖的电流密度。在Fe_(85.2)Si_1B_9P_4Cu_(0.8)合金上观察到最低无源电流密度为5×10〜(-6)A / cm〜2。另一方面,在去除氧化膜之前和之后,合金的点蚀电位高达约0.96V,并且与合金的化学组​​成无关。 Si和P的添加可以通过改变氧化膜的化学成分来增强Fe_(85.2)Si_xB_9P_5-_xCu_(0.8)合金的耐蚀性。循环伏安法结果表明,Si的添加抑制了二价Fe物种的形成速率,从而减慢了该速率确定步骤的反应速率。

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