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The determination of absolute anion formation cross sections from electron beam scattering data

机译:从电子束散射数据确定绝对阴离子形成截面

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摘要

Using recent low energy electron scattering data for CC1_4 and SF_6,and accompanying theory illustrating the coupling of attachment and elastic scattering,absolute cross sections are derived for electron attachment to CC1_4 and SF_6 between impact energies,respectively,of 8-52 meV and 7-42 meV.Values of attachment cross sections are compared with those obtained by laser and threshold photoionization techniques,which include normalization to rate coefficient data.Excellent agreement with the latest CC1_4 data is obtained,with less precise agreement for SF_6,but still lying within experimental uncertainties.
机译:利用CC1_4和SF_6的最新低能电子散射数据,并结合说明附着力和弹性散射的耦合理论,得出了冲击能量之间的电子附着到CC1_4和SF_6的绝对截面,分别为8-52 meV和7-比较了42 meV的附着截面值与通过激光和阈值电离技术获得的附着截面值(包括速率系数数据的归一化)。与最新的CC1_4数据具有很好的一致性,对于SF_6的精度较差,但仍在实验范围内不确定性。

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