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首页> 外文期刊>Crop Protection >Laboratory experiments of vacuum treatment in combination with an O-2 absorber for the suppression of Sitophilus granarius infestations in stored grain samples
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Laboratory experiments of vacuum treatment in combination with an O-2 absorber for the suppression of Sitophilus granarius infestations in stored grain samples

机译:结合O-2吸收剂进行真空处理以抑制谷物样品中的嗜Sitophilus granarius侵染的实验室实验

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The effectiveness of vacuum (V) treatment alone and in combination with an oxygen absorber (V + A) for suppression of grain infestation by Sitophilus granarius L were compared under laboratory conditions. The effectiveness of the treatment methods was evaluated at different temperatures (15, 25 degrees C) and exposure times (7, 14, 21, 28 days). We evaluated both the effects on adults present in grain interspaces and hidden infestations within the kernels in terms of treatment time separately. Adults of S. granarius present in grain interspaces were more susceptible to both treatments than hidden infestations developing within kernels. At 25 degrees C, total mortality of adults in grain interspaces was achieved after 10 days of exposure whereas total suppression of hidden infestations was achieved after 3 weeks. Higher temperature and longer exposure correlated with a greater effectiveness of the tested treatments. The addition of an oxygen absorber to the vacuum treatment (V + A) showed the general tendency of improving the effectiveness of the vacuum treatment on suppression of hidden infestations; significant differences between the V + A and V treatments were prominent primarily at the lower temperature tested. Reduction of hidden infestation was achieved after 3 weeks of exposure to V + A treatment (99.8%) and after 4 weeks of V treatment (95.8%) at 15 degrees C.
机译:在实验室条件下,比较了单独使用真空(V)处理和与氧气吸收剂(V + A)联合使用对抑制Sitophilus granarius L侵染谷物的效果。在不同的温度(15、25摄氏度)和暴露时间(7、14、21、28天)下评估了处理方法的有效性。我们分别根据处理时间评估了对谷物间隙中存在的成虫的影响以及对籽粒中隐藏的侵扰的影响。谷物间隙中存在的S. granarius成虫比谷粒内隐藏的侵扰更易受两种处理的影响。在25摄氏度下,暴露10天后,谷物间的成年总死亡率得以实现,而3周后,隐患的全部抑制得到了抑制。较高的温度和较长的暴露时间与测试处理的有效性较高相关。在真空处理中添加氧气吸收剂(V + A)显示出提高真空处理抑制隐患的总体趋势。 V + A和V处理之间的显着差异主要在较低的测试温度下突出。在15°C下接受V + A处理3周(99.8%)和进行V处理4周(95.8%)后,隐患减少了。

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