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首页> 外文期刊>Physica, C. Superconductivity and its applications >Influence of Ar background gas pressure on composition and crystal orientation in PLD-Fe(Se1-xTex) thin films
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Influence of Ar background gas pressure on composition and crystal orientation in PLD-Fe(Se1-xTex) thin films

机译:Ar背景气压对PLD-Fe(Se1-xTex)薄膜组成和晶体取向的影响

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摘要

Fe(Se_(1-x)Te_x) thin films on (1 0 0) SrTiO_3 were fabricated by a pulsed laser deposition method, and their crystal orientation, compositional shifts and superconducting properties were characterized by X-ray diffraction, scanning electron microscope combined with energy dispersive X-ray spectroscopy, etc. Compositional shift is one of the major problems during the fabrication of Fe(Se_(1-x)Te_x) films due to its containing high volatile elements such as Se and Te. The compositional shifts were found dependent on the Ar background gas pressure (P_(Ar)), which was suppressed by the increase of P_(Ar). In addition, it was revealed that the temperature window for the crystallization of the films was shifted to higher temperature region and wider temperature range with the increase of P_(Ar).
机译:通过脉冲激光沉积法在(1 0 0)SrTiO_3上制备Fe(Se_(1-x)Te_x)薄膜,并通过X射线衍射,扫描电镜结合表征了它们的晶体取向,组成位移和超导性能。 Fe(Se_(1-x)Te_x)薄膜由于包含高挥发性元素(例如Se和Te),因此组成偏移是制造Fe(Se_(1-x)Te_x)薄膜过程中的主要问题之一。发现组成变化取决于Ar背景气压(P_(Ar)),该压力被P_(Ar)的增加所抑制。另外,揭示了随着P_(Ar)的增加,用于薄膜结晶的温度窗口移到更高的温度区域和更宽的温度范围。

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