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Critical behavior of ferromagnetic Ising thin films

机译:铁磁伊辛薄膜的临界行为

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In the present work, we study the magnetic properties and critical behavior of simple cubic ferromagnetic thin films. We simulate L x L x d films with semifree boundary conditions on the basis of the Monte Carlo method and the Ising model with nearest neighbor interactions. A Metropolis dynamics was implemented to carry out the energy minimization process. For different film thickness, in the nanometer range, we compute the temperature dependence of the magnetization, the magnetic susceptibility and the fourth order Binder's cumulant. Bulk and surface contributions of these quantities are computed in a differentiated fashion. Additionally, according to finite size scaling theory, we estimate the critical exponents for the correlation length, magnetic susceptibility, and magnetization. Results reveal a strong dependence of critical temperature and critical exponents on the film thickness. The obtained critical exponents are finally compared to those reported in literature for thin films. (c) 2006 Elsevier B.V. All rights reserved.
机译:在目前的工作中,我们研究了简单立方铁磁薄膜的磁性和临界行为。我们在蒙特卡罗方法和具有最邻近相互作用的伊辛模型的基础上,模拟了具有半自由边界条件的L x L x d薄膜。实施了大都市动力学来进行能量最小化过程。对于不同的膜厚度,在纳米范围内,我们计算了磁化强度,磁化率和四阶粘结剂的累积量与温度的关系。这些数量的体积和表面贡献以差异方式计算。此外,根据有限尺寸缩放理论,我们估计了相关长度,磁化率和磁化强度的临界指数。结果表明临界温度和临界指数对薄膜厚度的强烈依赖性。最后将获得的临界指数与文献中报道的薄膜进行比较。 (c)2006 Elsevier B.V.保留所有权利。

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