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Synthesis of single crystal Sn-doped In2O3 na no wires: size-dependent conductive characteristics

机译:无导线Sn掺杂In2O3单晶的合成:尺寸依赖的导电特性

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摘要

Single crystalline Sn doped In2O3 (ITO) NWs (nanowires) were synthesized via an Au-catalyzed VLS (vapor-liquid-solid) method at 600 °C. The different sizes (~20, ~40, ~80 nm) of the Au NPs (nanoparticles) provided the controllable diameters for ITO NWs during growth. Phase and microstructures confirmed by high-resolution transmission electron microscope images (HRTEM) and X-ray diffraction (XRD) spectra indicated that the phase of In2O3 NWs had a growth direction of [100]. X-ray photoelectron spectroscopy (XPS) was employed to obtain the chemical compositions of the ITO NWs as well as the ratio of Sn/In and oxygen concentrations. The findings indicated that low resistivity was found for ITO NWs with smaller diameters due to higher concentrations of oxygen vacancies and less incorporation of Sn atoms inside the NWs. The resistivity of NWs increases with increasing diameter due to more Sn atoms, being incorporated into the NW and their reduction of the amount of oxygen vacancies. Low resistivity NWs could be achieved again due to excess Sn atoms doped into the large diameter NWs. Therefore, by optimizing the well-controlled growth of the NW diameter and interface states, we are able to tune the electrical properties of Sn-doped ITO NWs.
机译:通过Au催化的VLS(汽-液-固)方法在600°C下合成了单晶掺杂Sn的In2O3(ITO)NW(纳米线)。不同尺寸(〜20,〜40,〜80nm)的金纳米颗粒(纳米颗粒)在生长过程中为ITO纳米线提供了可控制的直径。通过高分辨率透射电子显微镜图像(HRTEM)和X射线衍射(XRD)光谱确认的相和微观结构表明In2O3 NWs的相具有生长方向[100]。使用X射线光电子能谱(XPS)来获得ITO NW的化学组成以及Sn / In和氧浓度的比率。结果表明,由于较高的氧空位浓度和较少的NW内掺入Sn原子,对于直径较小的ITO NW,发现电阻率较低。 NWs的电阻率随着直径的增加而增加,这是由于更多的Sn原子被结合到NW中并减少了氧空位的数量。由于过量的Sn原子被掺杂到大直径NW中,因此可以再次实现低电阻NW。因此,通过优化可控的NW直径和界面状态的增长,我们能够调整Sn掺杂的ITO NW的电性能。

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