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首页> 外文期刊>Optics Letters >Large-area, uniform, high-spatial-frequency ripples generated on silicon using a nanojoule-femtosecond laser at high repetition rate
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Large-area, uniform, high-spatial-frequency ripples generated on silicon using a nanojoule-femtosecond laser at high repetition rate

机译:使用纳焦飞秒激光以高重复频率在硅上产生的大面积,均匀,高空间频率的纹波

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摘要

Large-area high-spatial-frequency patterns (HSFLs) of lambda/6 periodicity have been generated by a nanojoule-femtosecond laser scanning technique (80 MHz, 170 fs, 700-950 nm) at the silicon-air interface. The excellent large-area uniformity allowed reproducible and accurate measurements of the periodicity. Variation of experimental parameters as illumination geometry, and pulse energy and number showed no influence on the ripple spacing. A wavelength dependence was observed and compared to current models of HSFL formation. A particular second-armonic model was found to match the results best but needs to take into account transient changes in the refractive index under laser exposure. A second-harmonic mechanism is further supported by direct spectroscopic observation.
机译:通过硅空气界面的纳米焦耳飞秒激光扫描技术(80 MHz,170 fs,700-950 nm)已经生成了λ/ 6周期性的大面积高空间频率图案(HSFL)。出色的大面积均匀性允许对周期进行可重复且精确的测量。实验参数如照明几何形状,脉冲能量和数量的变化对纹波间隔没有影响。观察到波长依赖性,并将其与当前HSFL形成模型进行比较。发现一个特定的二次电子模型与结果最匹配,但是需要考虑到激光照射下折射率的瞬态变化。直接光谱观察进一步支持了二次谐波机制。

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