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Ordered Ferroelectric PVDF-TrFE Thin Films by High Throughput Epitaxy for Nonvolatile Polymer Memory

机译:高通量外延订购的铁电PVDF-TrFE薄膜用于非易失性聚合物存储

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摘要

High throughput epitaxy of a thin ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) film is demonstrated on a molecularly ordered poly(tetrafluoroethylene) (PTFE) substrate based on spin coating method over the area of a few centimeter square. The lattice match between (010)(PVDF-TrFE) and (100)(PTFE) results in b and c axes of PVDF-TrFE crystals preferentially parallel to a and c of PTFE, respectively and consequently produces global ordering of the edge-on PVDF-TrFE crystalline lamellae aligned perpendicular to the rubbing direction of PTFE, its c-axis. The epitaxially grown PVDF-TrFE film is successfully incorporated for arrays of ferroelectric capacitors that exhibit not only the significant reduction of ferroelectric thermal hysteresis but also the descent remanent polarization at very low effective operating voltage of +/- 5 V maintained to 88% of its initial value after number of fatigue cycles of 5 x 10(8) in the mode of bipolar pulse switching. A ferroelectric field effect transistor memory with epitaxially grown PVDF-TrFE layer as gate dielectric shows the saturated I-V hysteresis with bistable on/off ratio of approximately 10(2).
机译:基于旋涂法,在分子有序的聚四氟乙烯(PTFE)基板上,在几平方厘米的面积上展示了薄的铁电聚偏二氟乙烯-三氟乙烯共聚物(PVDF-TrFE)薄膜的高通量外延。 (010)(PVDF-TrFE)与(100)(PTFE)之间的晶格匹配导致PVDF-TrFE晶体的b和c轴分别优先平行于PTFE的a和c并因此产生边沿上的全局有序PVDF-TrFE晶体薄片垂直于PTFE的摩擦方向(其c轴)排列。外延生长的PVDF-TrFE薄膜已成功地用于铁电电容器阵列,该阵列不仅表现出铁电热滞的显着降低,而且在+/- 5 V的非常低的有效工作电压(保持其88%的有效工作电压)下仍具有下降的剩余极化。在双极脉冲切换模式下,疲劳循环数为5 x 10(8)后的初始值。具有外延生长的PVDF-TrFE层作为栅极电介质的铁电场效应晶体管存储器显示了饱和的I-V磁滞,双稳态开/关比约为10(2)。

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