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Fabrication and properties of ITO films treated by excited atomic oxygen

机译:激发原子氧处理的ITO薄膜的制备与性能

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We consider the crystallization of ITO films induced by excited atomic oxygen. Owing to it, transmittance of these films in visible ranges increased by approx20percent and surface impedance dropped from 36 down to 4.6OMEGA/square. The treatment temperature (127 deg C) was significantly below that of conventional crystallization (320 deg C). Application of elastic light scattering diagnostics shows that rms surface roughness increased from 2.65 nm up to 4.07 nm after film treatment. ITO treatment does not change isotropic azimuthal structure of the surface.
机译:我们考虑了由激发原子氧诱导的ITO膜的结晶。由于这些原因,这些薄膜在可见光范围内的透射率增加了约20%,表面阻抗从36降至4.6Ω/平方。处理温度(127℃)明显低于常规结晶的温度(320℃)。弹性光散射诊断技术的应用表明,膜处理后,均方根表面粗糙度从2.65 nm增加到4.07 nm。 ITO处理不会改变表面的各向同性方位角结构。

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