Reliable deposition of induced transmission filters with a single metal layer

摘要

The sensitivity of an induced transmission filter (ITF) design to deposition errors is analyzed for the case of a single metal layer ITF. Theoretical knowledge of the least and most sensitive layers within the ITF design improves deposition reliability when using broadband optical monitoring of only the dielectric part of such metal-dielectric filters. Linearly variable ITFs have been successfully fabricated using this developed approach for error compensation.