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Delta-doped electron-multiplied CCD with absolute quantum efficiency over 50percent in the near to far ultraviolet range for single photon counting applications

机译:Delta掺杂的电子倍增CCD,在近至远紫外范围内的绝对量子效率超过50%,适用于单光子计数应用

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摘要

We have used molecular beam epitaxy (MBE) based delta-doping technology to demonstrate nearly 100percent internal quantum efficiency (QE) on silicon electron-multiplied charge-coupled devices (EMCCDs) for single photon counting detection applications. We used atomic layer deposition (ALD) for antireflection (AR) coatings and achieved atomic-scale control over the interfaces and thin film materials parameters. By combining the precision control of MBE and ALD, we have demonstrated more than 50percent external QE in the far and near ultraviolet in megapixel arrays. We have demonstrated that other important device performance parameters such as dark current are unchanged after these processes. In this paper, we briefly review ultraviolet detection, report on these results, and briefly discuss the techniques and processes employed.
机译:我们已经使用基于分子束外延(MBE)的delta掺杂技术来演示用于单光子计数检测应用的硅电子倍增电荷耦合器件(EMCCD)上近100%的内部量子效率(QE)。我们将原子层沉积(ALD)用于减反射(AR)涂层,并实现了界面和薄膜材料参数的原子级控制。通过结合MBE和ALD的精确控制,我们已经证明了百万像素阵列在远紫外线和近紫外线中超过50%的外部QE。我们已经证明,在这些过程之后,其他重要的器件性能参数(例如暗电流)也保持不变。在本文中,我们简要回顾了紫外线检测,报告了这些结果,并简要讨论了所采用的技术和过程。

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