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Substrate temperature effect on the refractive index and a two-step film method to detect small inhomogeneities in optical films

机译:基材温度对折射率的影响和两步膜法检测光学膜中的微小不均匀性

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摘要

Nb_(2)O_(5) films were deposited by a reactive magnetron sputtering technique. The average refractive index was found to increase with the rise of substrate temperature. Modulated interference transmittance spectra were observed in the two-step films, which were prepared by stopping the deposition process in the middle of the designed sputtering time, and then, after a full cooling down to room temperature, starting the same deposition process again to complete the whole preparation of the films. A linearly graded-index model was used to explain the interference behavior. It was proved that the two-step film method was sensitive to the small inhomogeneity in the films. We also suggest that the inhomogeneity of sputtered films can be minimized by controlling the substrate temperature at a constant value.
机译:通过反应磁控溅射技术沉积Nb_(2)O_(5)膜。发现平均折射率随着基板温度的升高而增加。在两步膜中观察到调制的干涉透射率光谱,这是通过在设计的溅射时间中间停止沉积过程,然后在完全冷却至室温之后,再次开始相同的沉积过程以完成而制备的电影的整个准备。使用线性梯度指数模型来解释干扰行为。证明了两步膜法对膜中的微小不均匀性敏感。我们还建议可以通过将基板温度控制在恒定值来最小化溅射膜的不均匀性。

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