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Pulse anodic-cathodic electrochemical micromachining in presence of insulating masks

机译:绝缘掩膜存在下的脉冲阳极-阴极电化学微加工

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摘要

EIectrochemical micromachining (ECMM) of photo resist-patterned mild steel has been carried out in 1M NaCl pH = 1,0. It is shown that pulse anodic-cathodic micromachining (etching) results in significant increasing of the Etch Factor: EF~3,0 at direct current and EF~6,0 at anodic-cathodic micromachining. New combined method of machining (anodic-cathodic machining + direct current) has been applied. Due to this method it is possible to increase localization of dissolution (EF) at maintaining high rate of process.
机译:在1M NaCl pH = 1,0中进行了光刻胶图案的低碳钢的电化学微加工(ECMM)。结果表明,脉冲阳极阴极微加工(蚀刻)会导致蚀刻因子的显着增加:直流电时EF〜3,0,阳极阴极微加工时EF〜6,0。已应用新的组合加工方法(阳极-阴极加工+直流电)。由于这种方法,可以在保持高处理速率的情况下增加溶出度(EF)的局部性。

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