The stability and heat resistant of silicides coatings on refractory metals

摘要

Investigations devoted to understanding of the subsurface layer influence on stability of the high temperature MeSi{sub}2 type coatings on refractory metals are carried out. Experimentally it is established that in system WSi{sub}2 substructure layer and silicon depth distribution profile pay essential influence on formation of barrier layer from the lowest suicides, that mainly defines stability as a whole. On the basis of performed investigations sweep of more stable silicides coatings on hard-melted metals is going in direction of diffusion barriers creation not only on inner interface MeSi{sub}2-Me, but on internal surface too. Process of coating formation must continued with formation on internal surface of metal suicides with possible high silicon content.