Preparation of TiO_2 Thin Film Photocatalysts Working under Visible Light Irradiation by Applying a RF Magnetron Sputtering Deposition Method

摘要

TiO_2 thin film photocatalysts that can be operated under visible light irradiation were successfully designed and developed by applying an ion engineering technique, i.e., the RF magnetron sputtering deposition method. These TiO_2 thin film photocatalysts prepared at the relatively hgher deposition temperatures were able to absorb light in visible regions efficiently and were observed to decompose NO into N_2, O_2 ad N_2O under visible light (#lambda#>270 nm) irradiation at 275 K.