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A partition equilibrium study of sulfonephthalein dyes in anionic surfactant systems: determination of CMC in buffered medium

机译:阴离子表面活性剂体系中磺酞类染料的分区平衡研究:缓冲介质中CMC的测定

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A spectrophotometric method has been reported which can be used to simultaneously determine partition equilibrium constant of anionic sulfonephthalein (acid-base indicator) dyes between micellar pseudophase and aqueous phase, and critical micelle concentration (CMC) of the surfactants in buffered aqueous anionic surfactant systems. The method is based on two assumptions: (1) only one form of the dye goes into the micellar pseudophase, which holds for similarly charged dye-surfactant systems and (2) the activity terms for the conjugate acid and base forms of the dye can be combined in buffered solution. An absorption band, which decreases with addition of surfactant, is used for the analysis. The method has been found suitable to the systems of sulphonephthalein (anionic) dyes. viz. bromophenol blue (BPB), bromothymol blue (BTB) and thymol blue (TB) with anionic surfactants, viz. sodium dodecyl sulfate (SDS), sodium dodecyl benzene sulfonate (SDBS) and sodium dodecyl sulfonate (SDSN). The partition equilibrium constants have been found to be dependent on hydrophobicity of the dye and pH of the solutions. The CMC's have been found to increase with increase in pH for a particular buffer system. The method can conveniently be used for study of interactions in such dye-surfactant systems and to determine CMC of the anionic surfactants in buffered solutions. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 29]
机译:已经报道了一种分光光度法,该方法可用于同时测定阴离子磺基酞菁(酸碱指示剂)染料在胶束假相和水相之间的分配平衡常数,以及在缓冲水性阴离子表面活性剂体系中表面活性剂的临界胶束浓度(CMC)。该方法基于两个假设:(1)仅有一种形式的染料进入胶束假相,这适用于带电荷相似的染料表面活性剂系统;(2)染料罐中共轭酸和碱形式的活性项合并在缓冲溶液中。分析中使用吸收带,该吸收带随添加表面活性剂而降低。已经发现该方法适用于磺酞(阴离子)染料体系。即带有阴离子表面活性剂的溴酚蓝(BPB),溴百里酚蓝(BTB)和百里酚蓝(TB)。十二烷基硫酸钠(SDS),十二烷基苯磺酸钠(SDBS)和十二烷基磺酸钠(SDSN)。已经发现分配平衡常数取决于染料的疏水性和溶液的pH。对于特定的缓冲系统,已经发现CMC随pH的增加而增加。该方法可以方便地用于研究这种染料-表面活性剂体系中的相互作用,并确定缓冲溶液中阴离子表面活性剂的CMC。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:29]

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