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首页> 外文期刊>Journal of the Korean Physical Society >Study of the design optimization of AC-coupled single-sided silicon strip sensors
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Study of the design optimization of AC-coupled single-sided silicon strip sensors

机译:交流耦合单面硅条传感器设计优化研究

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The high-intensity rare-isotope accelerator, RAON, will be constructed for nuclear physics research in Korea. AC-coupled single-sided silicon strip detectors (SSSDs) are being investigated for use in the Si-CsI detector of a large acceptance multi-purpose spectrometer to measure the energies of various isotopes. To determine the optimal design, four SSSD design parameters were examined in this study, namely the ratio of p(+) implant width to strip pitch (I/P), the width of the metal layer, the presence of an n(+)-edge field shaper (FS), and the distance between the guard-ring and sensor edge (DGS). The designed detectors were fabricated on high resistivity n-type silicon wafers of 500 mu m thickness. The SSSDs had the strip pitch of 730 mu m and 32 readout strips in each, and the size of the sensors was 40.0 x 25.5 mm(2). In terms of the leakage current and production yield, the noise improved by up to 30%when the I/P ratio was 0.4, the metal layer was wider than the p(+) implantation, and the DGS with n(+)-edge FS was twice the sensor thickness. The signal-to-noise ratio of the SSSD with the design parameters that provided the optimal leakage current and coupling capacitance was measured to be 29.1 using a Sr-90 radioactive source and commercial electronics.
机译:高强度稀有同位素加速器RAON将在韩国进行核物理研究。交流耦合的单面硅条探测器(SSSD)正在研究中,该探测器可用于大型验收多功能光谱仪的Si-CsI探测器,以测量各种同位素的能量。为了确定最佳设计,本研究中检查了四个SSSD设计参数,即p(+)注入宽度与带间距(I / P)的比率,金属层的宽度,n(+)的存在边缘场整形器(FS),以及保护环和传感器边缘之间的距离(DGS)。设计的探测器是在500微米厚的高电阻率n型硅晶片上制造的。 SSSD的条带间距为730微米,每个条带具有32个读出条带,传感器的尺寸为40.0 x 25.5 mm(2)。在漏电流和成品率方面,当I / P比为0.4,金属层宽于p(+)注入和具有n(+)边缘的DGS时,噪声最多可提高30% FS是传感器厚度的两倍。使用Sr-90放射源和商用电子设备,具有提供最佳泄漏电流和耦合电容的设计参数的SSSD的信噪比被测量为29.1。

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