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A ternary compound additive for vacuum densification of beta-silicon carbide at low temperature

机译:用于低温真空致密化β-碳化硅的三元复合添加剂

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摘要

The thermal decomposition behavior of a ternary carbide compound (Al_4SiC_4) was investigated under vacuum conditions. Decomposition of Al_4SiC_4 occurred above 1450 deg C, resulting in the formation of SiC and carbon phases in the matrix, with some losses of Al. To simultaneously obtain the densification and refinement of SiC, the potential of the compound as a sintering additive for low-temperature sintering of SiC was evaluated and compared to cases of SiC with Al_4C_3 and Al_2O_3 additives. SiC that was almost entirely densified with fine and elongated grains was successfully formed using a 10 wt percent Al_4SiC_4 additive by hot pressing at 1700 deg C for 2 h in a vacuum. During the densification, the decomposition behavior of the Al_4SiC_4 was strongly related to the densification behavior of the SiC.
机译:研究了三元碳化物(Al_4SiC_4)在真空条件下的热分解行为。 Al_4SiC_4的分解在1450摄氏度以上发生,导致在基体中形成SiC和碳相,并损失了一些Al。为了同时获得SiC的致密化和细化,评估了该化合物作为SiC低温烧结的烧结添加剂的潜力,并将其与含Al_4C_3和Al_2O_3添加剂的SiC的情况进行了比较。通过在真空中在1700摄氏度下热压2 h,使用10 wt%Al_4SiC_4添加剂成功地形成了几乎完全被细小且细长的晶粒致密的SiC。在致密化过程中,Al_4SiC_4的分解行为与SiC的致密化行为密切相关。

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