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Structure and mechanical properties of the hybrid films of well dispersed SiO_2 nanoparticle in polyimide (PI/SiO_2) prepared by sol-gel process

机译:溶胶-凝胶法制备聚酰亚胺(PI / SiO_2)中分散良好的SiO_2纳米粒子杂化膜的结构和力学性能

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The hybrid films of well dispersed SiO_2 nanoparticle in polyimide (PI/SiO_2) were prepared through the sol-gel processing. The pure PI was synthesized from 4, 4′,-oxydianaline (ODA) and pyromellitic dianhydride (PMDA). The residual amino groups which were controlled by the reactant stoichiometric ratio reacted with the coupling agent isocyanatopropyltriethoxysilane (ICTOS) to provide an organic-inorganic bonding. A series amount of tetraethoxysilane (TEOS) was then added, thus producing chemically bonded composite films. The films with different silica contents (0 wt %, 5 wt %, 8 wt %, 10 wt %, 13 wt %, and 15 wt %) were characterized by a variety of techniques including FT-IR, SEM, TGA, and tensile analysis. The results indicated that the chemical interaction between the two phases resulted in the formation of well-dispersed nanoparticles (20-30 nm) in the PI matrix, and superior thermal stability of hybrid films. The tensile measurement showed that the mechanical properties were markedly improved with incorporating various amount of silica, and the maximum of tensile strength was 105.4 MPa with10 wt % of silica concentration.
机译:通过溶胶-凝胶法制备了聚酰亚胺(PI / SiO_2)中分散良好的SiO_2纳米颗粒的杂化膜。纯的PI由4,4'-氧化二氢萘啉(ODA)和均苯四甲酸二酐(PMDA)合成。通过反应物化学计量比控制的残余氨基与偶联剂异氰酸根合丙基三乙氧基硅烷(ICTOS)反应,以提供有机-无机键合。然后添加一系列的四乙氧基硅烷(TEOS),从而产生化学键合的复合膜。通过多种技术(包括FT-IR,SEM,TGA和拉伸)对具有不同二氧化硅含量(0 wt%,5 wt%,8 wt%,10 wt%,13 wt%和15 wt%)的薄膜进行表征分析。结果表明,两相之间的化学相互作用导致在PI基质中形成分散良好的纳米颗粒(20-30 nm),并具有优异的杂化膜热稳定性。拉伸测量结果表明,掺入各种量的二氧化硅可显着改善机械性能,并且在二氧化硅浓度为10 wt%时,最大拉伸强度为105.4 MPa。

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