THE EFFECT OF TI ADDITION ON THE THERMAL STABILITY OF ALPHA''-FE16N2

摘要

(Fe,Ti)-N films containing alpha ''-Fe16N2 phase were prepared on Si and NaCl single-crystal substrates by facing target sputtering (FTS). An analytical transmission electron microscope was used for the structural studies prior to and during in situ annealing of the samples. The as-deposited films with 3-5 at.% Ti contained alpha ''-(Fe,Ti)(16)N-2 and alpha-Fe phases and films with 15-18 at.% Ti comprised alpha '' phase and TiN phase. The alpha '' phase was the dominant phase in the two samples. It existed stably during in situ annealing from room temperature to 700 degrees C, and remained stable when the samples were cooled down to room temperature. It is found that proper Ti addition can stabilize the alpha '' phase to a temperature of 700 degrees C. The saturation magnetization of the two annealed samples was 2.68 and 2.46 T respectively, which is larger than that of pure iron. [References: 10]