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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Bias-induced structural evolution of diamond films in plasma enhanced hot filament chemical vapour deposition with a two-step process
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Bias-induced structural evolution of diamond films in plasma enhanced hot filament chemical vapour deposition with a two-step process

机译:偏压引起的金刚石膜在等离子体增强的热丝化学气相沉积中的两步过程引起的结构演变

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摘要

We report the structural evolution of diamond films in a plasma assisted hot filament chemical vapour deposition system with a variable substrate bias through a two-step process including deposition and subsequent modification. It is found that the diamond surfaces can be significantly modified after the treatment of hydrogen plasma. The surfaces with pyramidic structures form under the proper treated duration and temperature with a decrease in the content of amorphous carbon. As the treatment is prolonged, the surface presents ellipsoid structures while the diamond film becomes amorphous. Furthermore, 50 mu m-long columns appear instead of the ellipsoids in a higher regime of the substrate temperature. These results suggest that the hydrogen plasma treatment and substrate temperature can significantly tune the surface topography of diamond films, and even give rise to chemical bonding variations with pronounced surface structures.
机译:我们报告了金刚石薄膜在等离子体辅助热丝化学气相沉积系统中的金刚石膜的结构演变,该过程通过包括沉积和后续修饰的两步过程实现了可变的基材偏压。发现在氢等离子体处理之后,金刚石表面可以被显着改性。具有锥体结构的表面在适当的处理时间和温度下形成,非晶碳含量降低。随着处理时间的延长,表面呈现椭圆形结构,而金刚石膜变为非晶态。此外,在较高的基板温度范围内,出现了50μm长的柱形,而不是椭圆形。这些结果表明,氢等离子体处理和基底温度可以显着调整金刚石膜的表面形貌,甚至引起具有明显表面结构的化学键变化。

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