Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Takano Hiroki; Wang Lei; Tanaka Yuki; Maeda Rina; Kihara Naoko; Seino Yuriko; Sato Hironobu; Kawamonzen Yoshiaki; Miyagi Ken; Minegishi Shinya; Azuma Tsukasa; Ober Christopher K.; Hayakawa Teruaki

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Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

机译：无中性层的含氟和含硅嵌段共聚物的垂直取向层状形成

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来源
《Journal of Photopolymer Science and Technology》 |2015年第5期|共4页
作者
Takano Hiroki; Wang Lei; Tanaka Yuki; Maeda Rina; Kihara Naoko; Seino Yuriko; Sato Hironobu; Kawamonzen Yoshiaki; Miyagi Ken; Minegishi Shinya; Azuma Tsukasa; Ober Christopher K.; Hayakawa Teruaki;
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正文语种 eng
中图分类感光材料工业;光化学物质;
关键词
block copolymer; fluorine; vertical oriented lamellar; thin film; surface segregation;

机译：嵌段共聚物;氟;垂直层状;薄膜;表面偏析;

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专利

1. Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers [J] . Takano Hiroki, Wang Lei, Tanaka Yuki, Journal of Photopolymer Science and Technology . 2015,第5期

机译：无中性层的含氟和含硅嵌段共聚物的垂直取向层状形成
2. Preparation of oriented liquid-crystalline/isotropic block copolymer films with parallel or perpendicular arrangement of smectic layers and lamellar microdomains [J] . Figueiredo P., Gronski W., Bach M. Macromolecular rapid communications: Publishing the newsletters of the European Polymer Federation . 2002,第1期

机译：具有近晶层和层状微区的平行或垂直排列的取向液晶/各向同性嵌段共聚物薄膜的制备
3. APS -APS March Meeting 2017 - Event - Vertically Oriented Microdomains of Lamellar Block Copolymer Films with High Temperature Gradient Cold Zone Annealing [J] . Monali Basutkar, Saumil Samant, Joseph Strzalka, Bulletin of the American Physical Society . 2017,第4期

机译：APS -APS 2017年3月会议-活动-带高温梯度冷区退火的层状嵌段共聚物薄膜的垂直取向微区
4. Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-χ block copolymers [C] . P. Bézard, X. Chevalier, A. Legrain, SPIE Conference on Advanced Etch Technology for Nanopatterning . 2018

机译：层状硅含硅嵌段共聚物的Graphoepitaxy积分和图案转移
5. Directed self-assembly of block copolymers and ternary block copolymer/homopolymer blends on chemically patterned surfaces into device-oriented geometries. [D] . Stoykovich, Mark P. 2007

机译：嵌段共聚物和三元嵌段共聚物/均聚物共混物在化学图案化表面上的定向自组装成面向装置的几何形状。
6. Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography [O] . Dipu Borah, Cian Cummins, Sozaraj Rasappa, 2018

机译：通过自组装形成层状聚苯乙烯嵌段聚（二甲基硅氧烷）二嵌段共聚物通过纳米压印光刻技术制备的纳米图案。
7. Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers [O] . Hiroki Takano, Lei Wang, Yuki Tanaka, 2015

机译：垂直定向的层状板形成含氟和含硅嵌段共聚物，没有中性层

Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

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