首页> 外文期刊>Journal of Micromechanics and Microengineering >Multilayer bonding using a conformal adsorbate film (CAF) for the fabrication of 3D monolithic microfluidic devices in photopolymer
【24h】

Multilayer bonding using a conformal adsorbate film (CAF) for the fabrication of 3D monolithic microfluidic devices in photopolymer

机译:使用保形吸附膜(CAF)进行多层键合,以在光敏聚合物中制造3D单片微流控器件

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Reliable microfabrication processes and materials compatible with complementary metal-oxide semiconductor (CMOS) technology are required by industry for the mass production of complex and highly miniaturized lab-on-a-chip systems. Photopolymers are commonly used in the semiconductor industry, and are suitable for the integration of multilayer structures onto CMOS substrates. This paper describes a novel photopolymer bonding process compatible with CMOS technology for the fabrication of three-dimensional monolithic microfluidic devices. The process consists of the formation of a conformal adsorbate film (CAF) approximately 15 nm thick on a patterned photopolymer layer (KMPR), thereby increasing the number of open polymer chains at the bonding interface and acting as an ultra-thin adhesive layer. This thin adhesive layer is made of the same photopolymer as the microfluidic structures, but has a substantially lower crosslinking density so it will be able to make better bonds during a thermocompressive bonding step. This CAF treatment substantially improves the bonding yield between two patterned and previously crosslinked photopolymer layers because both optimum structure strength (to resist deformation during bonding) and bonding strength from epoxy crosslinking can be achieved. We demonstrate high bonding yields of up to 99% of the useful area of the substrate after three successive bonding steps. With this technique, up to six layers have been bonded in a single device. Unlike previously reported methods the quality of bonding is mostly decoupled from soft-bake parameters and crosslinking level of the previously patterned layers. Three different bonding processes were characterized to describe the bonding mechanism and the differences between the presented method and the partial-crosslinking bonding method. Capillary filling experiments were performed in microchannels of multilayer structures built with the CAF technique, without any observable leakage between layers.
机译:工业界需要大量可靠的微细加工工艺和与互补金属氧化物半导体(CMOS)技术兼容的材料,才能大量生产复杂且高度微型的芯片实验室系统。光敏聚合物通常用于半导体行业,并且适合将多层结构集成到CMOS基板上。本文介绍了一种新颖的与CMOS技术兼容的光聚合物键合工艺,用于制造三维单片微流控器件。该方法包括在图案化的光聚合物层(KMPR)上形成约15 nm厚的共形吸附膜(CAF),从而增加键合界面处的开放聚合物链数量,并充当超薄粘合剂层。该薄的粘合剂层由与微流体结构相同的光敏聚合物制成,但是具有显着较低的交联密度,因此它将能够在热压粘合步骤中进行更好的粘合。这种CAF处理可以显着提高两个已构图的和先前交联的光敏聚合物层之间的粘合率,因为可以同时获得最佳的结构强度(在粘合过程中抵抗变形)和环氧交联的粘合强度。在三个连续的粘合步骤之后,我们证明了高达99%的基板可用面积的高粘合率。通过这种技术,单个设备中最多可以粘合六层。与以前报道的方法不同,键合的质量主要与软烘烤参数和先前构图的层的交联程度脱钩。表征了三种不同的键合过程来描述键合机理以及所提出的方法与部分交联键合方法之间的差异。毛细管填充实验是在使用CAF技术构建的多层结构的微通道中进行的,各层之间没有任何可观察到的泄漏。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号