Fabrication of 3D nanostructures by multidirectional UV lithography and predictive structural modeling

摘要

This paper presents the fabrication and modeling of three-dimensional (3D) nanostructures by automated multidirectional ultraviolet (UV) lithography, which is a fast, cost-effective, manufacturable fabrication method. Multidirectional UV exposure is performed using a static UV light source equipped with a tilt-rotational substrate holder. A glass substrate with a nanopatterned chrome layer is utilized as both a photomask and a substrate, for which a backside UV exposure scheme is used. For the analytical modeling of the shape of fabricated nanostructures, UV exposure dosage, diffraction and refraction effects, and absorption rate are taken into account. For more accurate process predictive models, a commercially available multiphysics simulation tool is used. The structural shapes predicted from analytical calculation and simulation are compared with the fabricated ones for which various 3D nanoscale test structures are fabricated such as an inclined nanopillar array and a vertical triangular slab. Also, nanostructures with multiple heights are successfully implemented from single layer photoresist by controlling the UV exposure dosage and tilt angles. A tripod embedded horn and a triangular-slab embedded horn are demonstrated.