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A Study on the Hydrogen Evolving Activity of Electroplated Ni-P Coating by Using the Taguchi Method

机译:田口法研究Ni-P电镀层的析氢活性

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The optimal catalytic activity of the electrodeposited Ni-P coating with the control of the process parameters was performed in this study by using Taguchi's method. The controlled process parameters included current density, duty cycle and the concentration of the phosphorous acid in the electrolyte. The correlation among the controlled parameters and the resulted hydrogen evolution reaction (HER)activity was discussed with emphasis on the influence of the P content, internal stress, roughness and grain size of the coating. The optimal HER property was obtained for the electrodeposition of Ni-P coating with a phosphorous acid concentration of 5g/l, current density of 16A/dm~2 and duty cycle of 100 %. The resulted Ni-P coating with a better HER property was the one with P content 3at%, an internal stress higher than 10MPa, grain size 10~15nm and surface roughness higher than 100nm. In addition, the cracking of the coating due to high internal stress favored the raise of the HER activity.
机译:在这项研究中,使用田口方法对电沉积Ni-P涂层的最佳催化活性进行了控制。受控的工艺参数包括电流密度,占空比和电解质中亚磷酸的浓度。讨论了控制参数与所产生的析氢反应(HER)活性之间的相关性,重点讨论了磷含量,内应力,粗糙度和涂层粒径的影响。对于亚磷酸浓度为5g / l,电流密度为16A / dm〜2,占空比为100%的Ni-P涂层的电沉积,获得了最佳的HER性能。所得到的具有较好HER性能的Ni-P镀层是P含量为3at%,内应力大于10MPa,晶粒尺寸为10〜15nm,表面粗糙度大于100nm的镀层。另外,由于高内应力导致的涂层开裂有利于HER活性的提高。

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