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Preparation of h-BN nano-film coated alpha-Si3N4 composite particles by a chemical route

机译:化学路线制备h-BN纳米薄膜包覆的α-Si3N4复合粒子

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摘要

In this study, alpha-Si3N4 particles were successfully coated with h-BN nano-film by a novel chemical route. Ammonium biborate was deposited onto the surface of silicon nitride particles to form NH4HB4O7.3H(2)O-Si3N4 composite powders by the heterogeneous precipitation method in anhydrous ethanol solution. The obtained composite powders were dried at room temperature, then nitrided in an ammonia flow at 900degreesC and subsequently crystallized at 1600degreesC to obtain h-BN nano-film coated alpha-Si3N4 composite particles. The prepared composite particles were characterized by IR, SAM, TEM, HRTEM, TG and DSC techniques. TEM and HRTEM micrographs showed that alpha-Si3N4 particles were well coated by BN ultrathin film in thickness of 1 nm. [References: 16]
机译:在这项研究中,通过一种新颖的化学方法成功地将h-BN纳米膜覆盖了α-Si3N4颗粒。通过在无水乙醇溶液中的非均相沉淀法,将硼酸铵沉积在氮化硅颗粒的表面上以形成NH4HB4O7.3H(2)O-Si3N4复合粉末。将获得的复合粉末在室温下干燥,然后在900℃的氨流中氮化,随后在1600℃下结晶,以获得h-BN纳米膜涂覆的α-Si3 N 4复合颗粒。通过IR,SAM,TEM,HRTEM,TG和DSC技术对制备的复合颗粒进行了表征。 TEM和HRTEM显微照片显示,α-Si3N4颗粒已被BN超薄膜很好地覆盖,厚度为1 nm。 [参考:16]

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