Processing-phase diagrams: a new tool for solution-deposited thin-film development applied to the In5O(OPr~i)_(13)-In2O3 system

摘要

Understanding processing-property relationships of a precursor is important for achieving the desired properties in opto-electronic thin-films. This work highlights the construction of a processing-phase diagram of the novel In2O3 precursor In5O(OPr~i)_(13) for transparent conducting oxide applications. The decomposition behavior of the precursor was profiled with thermogravimetry, differential scanning calorimetry, and temperature programmed desorption mass spectroscopy. Decomposition occurred at 150-230 °C. Higher temperature exothermic reactions were identified as structural rearrangement/ ordering processes. The precursor powder was found to crystallize into the bixbyite structure at 300-350 °C, presenting a non-crystalline phase-processing window for the material. Crystallization of a film was monitored with in situ X-ray diffraction annealing, which showed a markedly higher crystallization onset of 500 °C and a much larger non-crystalline oxide window. The decomposition and crystallization behavior of the precursor powders and films were combined into a master processing-phase diagram. Solution deposited, crystalline In2O3 films annealed under Ar-4%H2 achieved a conductivity of 165 S cm~(-1) with high visible transparency (80%) and exhibited a mobility of 9.6 cm~2 V~(-1) s~(-1) with a carrier concentration of 1.1 × 10~(20) cm~(-3).