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The influence of laser wavelength on the structure, morphology, and photoluminescence properties of pulsed laser deposited CaS: Eu2+ thin films

机译:激光波长对脉冲激光沉积CaS:Eu2 +薄膜的结构,形态和光致发光性能的影响

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摘要

Europium-doped calcium sulfide thin films were grown on Si (100) substrates using the pulsed laser deposition technique. The influence of the laser wavelength on the structure, morphology, and photoluminescent properties of the films was studied. The X-ray diffraction data showed that the films were amorphous, except for the (200) diffraction peak observed from the films deposited at the wavelengths of 266 and 355 nm. The atomic force microscopy and Rutherford backscattering spectroscopy data showed that the film deposited at 355 nm was rougher and thicker than those deposited at 266 and 532 nm. As a result, the highest photoluminescence emission intensity around 650 nm was observed from the film deposited at 355 nm. This emission was attributed to the 4f(6)5d(1) -> 4f(7)Eu(2+) transitions of Eu2+ observed. These films were evaluated for blue light-emitting diodes.
机译:使用脉冲激光沉积技术在Si(100)衬底上生长掺的硫化钙薄膜。研究了激光波长对薄膜结构,形貌和光致发光性能的影响。 X射线衍射数据表明,除了在266和355nm的波长下沉积的膜观察到的(200)衍射峰以外,这些膜是非晶的。原子力显微镜和卢瑟福背散射光谱数据表明,在355 nm处沉积的薄膜比在266和532 nm处沉积的薄膜更粗糙和更厚。结果,从在355nm处沉积的膜观察到650nm附近的最高光致发光发射强度。该发射归因于观察到的Eu2 +的4f(6)5d(1)-> 4f(7)Eu(2+)跃迁。这些膜被评估为蓝色发光二极管。

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