首页> 外文期刊>Journal of Materials Science >Preparation of epitaxially grown LaSrCoO_(3) thin films on SrTiO_(3)(100) substrates by the dipping-pyrolysis process
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Preparation of epitaxially grown LaSrCoO_(3) thin films on SrTiO_(3)(100) substrates by the dipping-pyrolysis process

机译:浸渍热解法在SrTiO_(3)(100)衬底上外延生长LaSrCoO_(3)薄膜

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摘要

LaSrCoO_(3) thin films were spin-coated onto SrTiO_(3)(100) substrates by the dipping-pyrolysis process. X-ray diffraction θ-2θ scans and X-ray diffraction β scans were used to determine the crystallinity and in-plane alignment behavior of the films. The X-ray diffraction pattern shows the film obtained by annealing at 800℃ was highly oriented. The X-ray diffraction pole-figure analysis and reciprocal-space mapping (ω-2θ scans) of the resulting film showed that the film comprising the pseudocubic phase had an epitaxial relationship with the SrTiO_(3) substrate.
机译:通过浸渍-热解工艺将LaSrCoO_(3)薄膜旋涂到SrTiO_(3)(100)衬底上。使用X射线衍射θ-2θ扫描和X射线衍射β扫描来确定薄膜的结晶度和面内取向行为。 X射线衍射图表明,在800℃退火得到的膜是高度取向的。所得膜的X射线衍射极图分析和倒数空间映射(ω-2θ扫描)表明,包含伪立方相的膜与SrTiO_(3)衬底具有外延关系。

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