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首页> 外文期刊>Journal of Materials Science >DEPENDENCE OF GIANT MAGNETORESISTANCE ON MICROSTRUCTURES IN ION-BEAM CO-SPUTTERED COXAG1-X GRANULAR FILMS
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DEPENDENCE OF GIANT MAGNETORESISTANCE ON MICROSTRUCTURES IN ION-BEAM CO-SPUTTERED COXAG1-X GRANULAR FILMS

机译:巨大的磁致电阻对离子束共溅射COXAG1-X颗粒薄膜的微观结构的影响

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A number of structural analysis methods were employed to investigate the microstructures of ion-beam co-sputtering of CoxAg1-x (0 less than or equal to x less than or equal to 100 at %) granular films. For x = 22 at %, the sample which has the optimal giant magnetoresistance at room temperature, there exists either crystallized or highly disordered regions shown by high-resolution electron microscopy. At the boundary between cobalt granules and the silver matrix, lattice mismatch was formed, leading to roughness of the interfaces. X-ray diffraction and transmission electron microscopy revealed that the samples had fcc structure at low x, with (111) texture, and the hcp structure gradually appeared as x > 75 at %. Relative lattice expansion was observed as x increased. [References: 28]
机译:多种结构分析方法用于研究CoxAg1-x(0小于或等于x小于或等于100 at%)颗粒薄膜的离子束共溅射的微观结构。对于x = 22 at%,在室温下具有最佳巨磁电阻的样品,存在高分辨率或高分辨电子显微镜显示的结晶或高度无序的区域。在钴颗粒和银基质之间的边界处,形成晶格失配,导致界面粗糙。 X射线衍射和透射电子显微镜显示样品在低x处具有fcc结构,具有(111)织构,并且hcp结构在x> 75 at%时逐渐出现。当x增加时,观察到相对晶格膨胀。 [参考:28]

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