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首页> 外文期刊>Journal of Materials Science >The effects of C ion implantation on the near surface microstructure and properties of alpha alumina
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The effects of C ion implantation on the near surface microstructure and properties of alpha alumina

机译:碳离子注入对α氧化铝近表面微观结构和性能的影响

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Biomedical grade (>99.5% purity) alpha-alumina has been implanted with carbon ions at fluences ranging from 5 x 10(16) to 5 x 10(17) C ions/cm(2) at an ion energy of 75 keV. The surfaces of the alumina have been examined in cross-section using transmission electron microscopy (TEM) and the data correlated with both nanohardness measurements and computer based simulations (Transport and Range of Ions in Matter, TRIM). TEM examination of the implanted surface has demonstrated the formation of a sub-surface amorphous layer as well as other microstructural modifications that are characteristic of ion damage. The nanohardness of the near-surface alumina was determined as a function of depth and was found to be strongly dependent on the fluence used. (C) 2002 Kluwer Academic Publishers. [References: 22]
机译:生物医学级(纯度> 99.5%)的α-氧化铝已经以75 keV的离子能量以5 x 10(16)至5 x 10(17)C离子/ cm(2)的注量注入了碳离子。氧化铝的表面已用透射电子显微镜(TEM)进行了横截面检查,数据与纳米硬度测量和基于计算机的模拟(离子在物质中的传输和范围)相关。注入表面的TEM检查已证明形成了亚表面下的非晶层以及其他具有离子损伤特征的微结构修饰。确定近表面氧化铝的纳米硬度是深度的函数,并且发现其高度依赖于所使用的注量。 (C)2002 Kluwer学术出版社。 [参考:22]

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