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Magnetic properties and thermal stability of CoFeNi-based amorphous films

机译:CoFeNi基非晶膜的磁性能和热稳定性

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摘要

CoNiFe-based amorphous films were magnetron-sputtered to investigate their structural and magnetic properties, including annealing-induced effects and interfacial influence from additional layers of Ta and Cu. The amorphous structure was confirmed by diffraction experiments. The magnetic measurements showed a well-defined uniaxial anisotropy in plane, arising possibly from atom oblique incidence effects competing with the stray field of the magnetron. The anisotropy could be influenced by using a Ta buffer layer, though the interfacial reaction gives rise to a dead layer. A coercive force H-c of 1-2 Oe and a magnetization of 680 emu/cm(3) were measured at room temperature; properties which show promise for application in magnetotunneling junction devices. Thermal analyses showed a two-stage crystallization behavior, which started at 400degreesC and ended at about 600degreesC. The Curie temperature of the amorphous phase was estimated to be about 440degreesC. (C) 2004 Kluwer Academic Publishers.
机译:对基于CoNiFe的非晶膜进行磁控溅射研究其结构和磁性,包括退火引起的效应以及Ta和Cu附加层的界面影响。通过衍射实验确认了非晶态结构。磁测量显示出平面上明确定义的单轴各向异性,这可能是由于原子倾斜入射效应与磁控管的杂散场竞争而引起的。尽管界面反应会产生死层,但使用Ta缓冲层可能会影响各向异性。在室温下测得的矫顽力H-c为1-2 Oe,磁化强度为680 emu / cm(3);这些特性表明了在磁隧道结器件中的应用前景。热分析显示出两阶段的结晶行为,其始于400℃,结束于约600℃。非晶相的居里温度估计为约440℃。 (C)2004 Kluwer学术出版社。

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