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Hydrothermal Growth and Characterization of ZnO Nanostructures on R-plane Sapphire Substrates

机译:R平面蓝宝石衬底上水热生​​长和ZnO纳米结构的表征

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摘要

ZnO nanostructures were grown on R-plane sapphire substrates with seed layers annealed at different temperatures ranging from 600 to 800 °C. The properties of the ZnO nanostructures were investigated by scanning electron microscopy, high-resolution X-ray diffraction, UV-visible spectrophotometer, and photoluminescence. For the as-prepared seed layers, ZnO nanorods and ZnO nanosheets were observed. However, only ZnO nanorods were grown when the annealing temperature was above 700 °C. The crystal qualities of the ZnO nanostructures were enhanced when the seed layers were annealed at 700°C. In addition, the full width at half maximum (FWHM) of near-band-edge emission (NBE) peak was decreased from 139 to 129 meV by increasing the annealing temperature to 700 °C. However, the FWHM was slightly increased again by a further increase in the annealing temperature. Optical transmittance in the UV region was almost zero, while that in the visible region was gradually increased as the annealing temperature increased to 700 °C. The optical band gap of the ZnO nanostructures was increased as the annealing temperature increased to 700 °C. It is found that the optical properties as well as the structural properties of the rod-shaped ZnO nanostructures grown on R-plane sapphire substrates by hydrothermal method are improved when the seed layers are annealed at 700°C.
机译:ZnO纳米结构生长在R面蓝宝石衬底上,种子层在600至800°C的不同温度下退火。 ZnO纳米结构的性质通过扫描电子显微镜,高分辨率X射线衍射,紫外可见分光光度计和光致发光进行了研究。对于制备的种子层,观察到ZnO纳米棒和ZnO纳米片。但是,当退火温度高于700°C时,仅会生长ZnO纳米棒。当种子层在700°C退火时,ZnO纳米结构的晶体质量得到提高。另外,通过将退火温度提高到700°C,近带边缘发射(NBE)峰的半峰全宽(FWHM)从139 meV减小。然而,通过进一步提高退火温度,FWHM再次略微增加。随着退火温度升高至700°C,UV区域的透光率几乎为零,而可见光区域的透光率逐渐增加。随着退火温度升高至700°C,ZnO纳米结构的光学带隙增加。研究发现,当种子层在700°C退火时,通过水热法在R面蓝宝石衬底上生长的棒状ZnO纳米结构的光学性能和结构性能得到改善。

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