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首页> 外文期刊>Journal of iron and steel research >Magnetic Properties and Kinetics Parameters of Electroless Magnetic Loss CoFeB Films
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Magnetic Properties and Kinetics Parameters of Electroless Magnetic Loss CoFeB Films

机译:化学磁损耗CoFeB薄膜的磁性能和动力学参数

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Electroless CoFeB films with good soft magnetic properties were fabricated on polyester plastic substrate from sodium tartarate as a complexing agent.The plating rate of electroless CoFeB films is a function of concentration of sodium tetrahydroborate,pH of the plating bath,plating temperature and the metallic ratio.The estimated regression coefficient b_0 -b_3 confidence interval,residual error r and confidence interval r_(int)were confirmed by a computer program.The optimal composition of the plating bath was obtained and the dynamic electromagnetic parameters of films were measured in the 2 - 10 GHz range.At 2 GHz,the mu',mu" of the electroless CoFeB films were 304 and 76.6,respectively,as the concentration of reducer is 1 g/L.Magnetic hysteresis loop of the deposited CoFeB films show a remanence close to the saturation magnetization and coercivity of about 55.7 - 127.4 A/m.The loops along the hard axis display low anisotropic field H_k of 2 388 - 3 582 A/m.
机译:以酒石酸钠为络合剂在聚酯塑料基材上制备了具有良好软磁性能的化学镀CoFeB薄膜。化学镀CoFeB薄膜的镀覆速率是四氢硼酸钠浓度,镀液pH值,镀覆温度和金属比的函数。通过计算机程序确定估计的回归系数b_0 -b_3的置信区间,残差r和置信区间r_(int)。获得了镀液的最佳组成,并在2-下测量了薄膜的动态电磁参数10 GHz范围。在2 GHz时,化学还原剂的浓度为1 g / L,化学镀CoFeB膜的mu',mu“分别为304和76.6。沉积的CoFeB膜的磁滞回线显示出接近饱和磁化强度和矫顽力约为55.7-127.4 A / m。沿硬轴的环路显示出2 388-3 582 A / m的低各向异性场H_k。

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