Study of the dynamics of local particle removal efficiencies usinglocalized haze maps

摘要

The local particle removal efficiency (PRE) of nano particles in megasonic cleaning experiments isstudied. This approach makes it possible to quantify non uniform cleaning effects over the waferand to look into the dynamics of particle removal at different areas on the wafer. A direct correlationbetween PRE and megasonic induced damage of device structures demonstrates that a considerableamount of damage is already formed at less efficiently cleaned areas of the wafer.