首页> 外文期刊>Journal of Experimental and Theoretical Physics >Structure and magnetoresistance of a Ni_(79.7)Fe_(14.0)Co_(2.8)Zr_(2.0)Cu_(1.5) thin film
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Structure and magnetoresistance of a Ni_(79.7)Fe_(14.0)Co_(2.8)Zr_(2.0)Cu_(1.5) thin film

机译:Ni_(79.7)Fe_(14.0)Co_(2.8)Zr_(2.0)Cu_(1.5)薄膜的结构和磁阻

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摘要

The structure and magnetoresistance R of thin films based on Ni_(80)Fe_(20) permalloy doped with Co, Zr, and Cu have been examined by X-ray diffraction analysis and resistance measurement. The films have been obtained by ion plasma sputtering on oxidized silicon, fused quartz, and glass ceramic cold substrates. It has been shown that the structure of a film in the initial state is a mixture of solid solutions based on two phases: Ni(fcc) particles with a size of L ≈ 8 nm and (Zr_(0.67)Ni_(0.22)O_(0.11))γ particles with a size of L ≈ 12 nm. The R(H) dependences on the strength and direction of the magnetic field H have been obtained at room temperature for film samples in the initial state and after isothermal annealing at 653 K for 1 h. According to R(H) dependences and X-ray diffraction analysis, films in the initial state are assumingly in a superparamagnetic state, whereas they exhibit ferromagnetic properties after isothermal annealing.
机译:通过X射线衍射分析和电阻测量研究了基于掺有Co,Zr和Cu的Ni_(80)Fe_(20)坡莫合金的薄膜的结构和磁阻R。薄膜是通过在氧化硅,熔融石英和玻璃陶瓷冷基板上进行离子等离子溅射获得的。已经表明,初始状态下的膜结构是基于两个相的固溶体的混合物:尺寸为L≈8 nm的Ni(fcc)颗粒和(Zr_(0.67)Ni_(0.22)O_( 0.11))γ粒子,大小为L≈12 nm。在室温下,薄膜样品在初始状态下以及在653 K等温退火1小时后,已经获得了与磁场H的强度和方向有关的R(H)依赖性。根据R(H)依赖性和X射线衍射分析,假定初始状态的膜处于超顺磁性状态,而在等温退火后则表现出铁磁性能。

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