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Electrochemical studies of Fe and Pd deposition and their influence on the co-deposition of the Fe-Pd alloy

机译:Fe和Pd沉积的电化学研究及其对Fe-Pd合金共沉积的影响

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摘要

Electrodeposition process of the Fe-Pd thin films was investigated using cyclic voltammetry, chronopotentiometry and chronoamperometry methods. Deposition process was first studied for single metals; Fe, Pd. On the end a comparison with Fe-Pd alloy was performed. It was found that the deposition of Fe starts at 50 mV, deposition of Pd at 200 mV and the deposition of Fe-Pd alloy at 150 mV at more positive potentials, when instead of Au electrode as a working electrode Fe, Pd or Fe-Pd monolayered deposits are already present. Furthermore, a comparison of the deposition process of single metals with an alloy reveals that when Fe is accompanied with Pd, the deposition of Fe starts at more than 500 mV at more positive potentials. To understand this phenomenon, galvanostatic deposition at -100 mu A/cm(2) for 3600 s and potentiostatic depositions from -0.6 V to -1.3 V were performed with the deposits' composition and their microstructure studied. It was observed that in the case of the of Fe-Pd-alloy deposition, Pd deposits first and due to its catalytic behaviour it subsequently catalyses the reduction of Fe(II)Cit. (C) 2014 Elsevier B.V. All rights reserved.
机译:采用循环伏安法,计时电位法和计时电流法研究了Fe-Pd薄膜的电沉积过程。首先研究了单金属的沉积工艺;铁,钯最后,与Fe-Pd合金进行了比较。发现当代替金电极作为工作电极时,Fe的沉积开始于50 mV,Pd的沉积开始于200 mV,Fe-Pd合金的沉积开始于150 mV,Fe,Pd或Fe-作为工作电极。钯单层沉积物已经存在。此外,单金属与合金的沉积过程的比较表明,当Fe与Pd结合时,Fe的沉积开始于大于500 mV的正电势。为了理解这种现象,对沉积物的组成和微观结构进行了研究,并在-100 um A / cm(2)下进行了3600 s的恒电流沉积,以及从-0.6 V到-1.3 V的恒电位沉积。观察到,在Fe-Pd合金沉积的情况下,Pd首先沉积,并且由于其催化行为,其随后催化Fe(II)Cit的还原。 (C)2014 Elsevier B.V.保留所有权利。

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