首页> 外文期刊>Journal of chromatography, B. Analytical technologies in the biomedical and life sciences >Normal phase and reverse phase HPLC-UV-MS analysis of process impurities for rapamycin analog ABT-578: Application to active pharmaceutical ingredient process development
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Normal phase and reverse phase HPLC-UV-MS analysis of process impurities for rapamycin analog ABT-578: Application to active pharmaceutical ingredient process development

机译:雷帕霉素类似物ABT-578的工艺杂质的正相和反相HPLC-UV-MS分析:在活性药物成分工艺开发中的应用

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ABT-578, an active pharmaceutical ingredient (API), is a semi-synthetic tetrazole derivative of the fermented polyene macrolide rapamycin. Reverse phase (RP)-HPLC-UV-MS and normal phase (NP)-HPLC-UV-MS methods employing an LC/MSD trap with electrospray ionization (ESI) have been developed to track and map all significant impurities from the synthetic process. Trace-level tracking of key impurities occurring at various process points was achieved using complimentary methodologies, including a stability indicating reverse phase HPLC method capable of separating at least 25 starting materials and process-related impurities from the API (YMC-Pack Phenyl column, UV-MS, 210 nm) and a targeted reverse phase HPLC method capable of separating very polar compounds from crude reaction mixtures (Phenomenex Synergi Polar RP column. UV, 265 nm). In addition, a normal phase HPLC method condition with post-column modifier infusion is described for the separation of epimeric impurities. and analysis of aqueous-sensitive reactive species (YMC-Pack SIL column, UV-MS, 278 nm). Process control strategies were established with these combinations of analytical technologies for impurities analyses to enable a rich understanding of the ABT-578 process. (C) 2007 Elsevier B.V. All rights reserved.
机译:ABT-578是一种活性药物成分(API),是发酵的多烯大环内酯雷帕霉素的半合成四唑衍生物。已开发出采用LC / MSD捕集阱和电喷雾电离(ESI)的反相(RP)-HPLC-UV-MS和正相(NP)-HPLC-UV-MS方法来跟踪和绘制合成过程中的所有重要杂质。使用互补方法可对各种工艺点处发生的关键杂质进行痕量跟踪,包括稳定性指示反相HPLC方法,该方法能够从API中分离出至少25种原料和与工艺相关的杂质(YMC-Pack苯基色谱柱,UV -MS,210 nm)和靶向反相HPLC方法,能够从粗反应混合物中分离出极极性的化合物(Phenomenex Synergi Polar RP色谱柱,UV,265 nm)。此外,还介绍了采用柱后修饰剂注入的正相HPLC方法条件,用于分离差向异构体杂质。和水敏感反应物种的分析(YMC-Pack SIL色谱柱,UV-MS,278 nm)。通过将这些分析技术的组合用于杂质分析,建立了过程控制策略,以使您对ABT-578过程有更深入的了解。 (C)2007 Elsevier B.V.保留所有权利。

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