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Polymer Masks Fabrication by Micropatterning Surfaces of Composite Polymer Coatings

机译:通过复合材料涂层的微图案化表面制备聚合物掩模

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Micropatterning of surfaces has been demonstrated using composite polymer coatings of PS and PMMA of equal molecular weights in different volume proportions with varying surface topographies on silicon surfaces. The creation of PMMA masks with various surface morphological features has also been demonstrated by removal of PS from the composite coatings using cyclohexane. Atomic force microscopy (AFM) investigations revealed that the surface pattern and the dimensions of these masks significantly changed with the change in the volume proportions of each homopolymer. The composite coatings of 20/80 vol% PS/PMMA, 50/50 vol% PS/PMMA, and 80/20 vol% PS/PMMA resulted in PMMA masks with holes (depth ~300 nm), wrinkles (height ~350 nm) and pillars (height ~600 nm), respectively. Surface compositional analysis carried out using FTIR and XPS investigations confirmed the presence of polymer coatings of PS, PMMA and PS/PMMA. XPS investigations also confirmed the successful removal of PS from the PMMA mask by showing the presence of the silicon substrate on those masks where PS was previously present. The water contact angle of the composite polymer masks ranged from 70 to 90° which increased with the increase of PS vol% in the composite. The wetting behavior of certain PMMA masks showed hydrophobicity with water contact angle values above 90°.
机译:使用具有不同体积比例的等分子量的PS和PMMA的复合聚合物涂层以及在硅表面上具有不同的表面形貌,已经证明了表面的微图案化。通过使用环己烷从复合涂层中去除PS也证明了具有各种表面形态特征的PMMA掩模的创建。原子力显微镜(AFM)研究表明,这些掩模的表面图案和尺寸随每种均聚物的体积比例的变化而显着变化。 20/80体积%PS / PMMA,50/50体积%PS / PMMA和80/20体积%PS / PMMA的复合涂层导致PMMA面膜带有孔(深度约300 nm),皱纹(高度约350 nm) )和支柱(高度约600 nm)。使用FTIR和XPS研究进行的表面成分分析证实了PS,PMMA和PS / PMMA的聚合物涂层的存在。 XPS研究还通过证明先前存在PS的那些掩模上存在硅衬底,证实了从PMMA掩模中成功去除了PS。复合聚合物掩模的水接触角在70°至90°的范围内,其随着复合物中PS体积%的增加而增加。某些PMMA面膜的润湿行为在水接触角值大于90°时显示出疏水性。

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