首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Observations on the growth of Al-Ni-Co decagonal thin films by atomic force microscopy and transmission electron Microscopy
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Observations on the growth of Al-Ni-Co decagonal thin films by atomic force microscopy and transmission electron Microscopy

机译:原子力显微镜和透射电子显微镜观察Al-Ni-Co十边形薄膜的生长

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摘要

Thin films of Al-Ni-Co alloy were produced by vacuum deposition technique using a substrate material of amorphous carbon thin-foil. Attempts were made to obtain a homogeneous decagonal quasicrystalline film, where the preparation technique was based on the direct evaporation of pre-alloyed ingot of Al_(72)Ni_(15)Co_(13) onto the heated substrates. In order to explore early stages of the decagonal film growth, the Al-Ni-Co films with different thicknesses ranging from 2nm to 30 nm were deposited on either substrates heated at 500 deg C or non-heated substrates. The film samples so obtained were examined mainly by atomic force microscopy in combination with transmission electron diffraction and imaging techniques. On the basis of these observations, deposition conditions necessary for the growth of decagonal phase in the resulting films as well as the growth mechanism of the decagonal film will be discussed.
机译:通过使用非晶碳薄箔的基材材料通过真空沉积技术来制造Al-Ni-Co合金的薄膜。尝试获得均匀的十边形准晶膜,其中制备技术基于Al_(72)Ni_(15)Co_(13)的预合金锭直接蒸发到加热的基材上。为了探索十边形薄膜生长的早期阶段,将厚度范围从2nm到30nm的Al-Ni-Co薄膜沉积在加热到500摄氏度的基板上或未加热的基板上。如此获得的膜样品主要通过原子力显微镜结合透射电子衍射和成像技术进行检查。基于这些观察,将讨论在所得膜中生长十方相所需的沉积条件以及该十方膜的生长机理。

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