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首页> 外文期刊>Journal of Applied Electrochemistry >Electrodeposition of compositionally modulated Au/Co alloy layers
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Electrodeposition of compositionally modulated Au/Co alloy layers

机译:成分调制的Au / Co合金层的电沉积

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摘要

Au/Co multilayers were electrodeposited from a single bath based on acid citrate, cobalt sulphate and gold cyanide electrolyte. The Taguchi statistical method was used for experiment planning and optimisation. X-ray diffraction (XRD) investigations of the structure showed that the Au deposits exhibited a polycrystalline fcc <1 1 1> structure with an estimated grain size of similar to7 nm, while the Co deposits exhibited a nano-polycrystalline fcc structure with an estimated grain size ranging between 2 and 28 nm and a strong in-plane texture. The XRD investigation of the multilayer structure also indicated an interface roughness of about 1.5 nm between the Au and Co layers. [References: 19]
机译:Au / Co多层膜是从单一电解槽中以柠檬酸,硫酸钴和氰化金电解液为基础进行电沉积的。 Taguchi统计方法用于实验计划和优化。结构的X射线衍射(XRD)研究表明,Au沉积物表现出多晶fcc <1 1 1>结构,估计晶粒尺寸接近7 nm,而Co沉积物表现出纳米多晶fcc结构,估计晶粒晶粒大小在2到28 nm之间,并且具有很强的平面纹理。多层结构的XRD研究还表明,金和钴层之间的界面粗糙度约为1.5 nm。 [参考:19]

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