Deposition mechanisms of nanoparticles for the creation of nanostructures due to charge patterns on flat substrates

摘要

The design of future electronic and opto-electronic devices is based on the ability to combine different materials like insulators,semiconductors and metals on a nanometer scale.An improvement of these skills will open ways for the production of new devices,which can not be produced with conventional methods,like UV-lithography and epitaxy.Aerosol technology offers an elegant route due to the fact that monodisperse nanocrystals can be synthesized easily in the gas phase.Their physical properties,which can be adjusted by varying the particle material,their size or shape,make them important candidates for a number of applications.For instance,structured thin films of monodisperse SnO2-particles can be used for gas sensor fabrication.Arrangements of single nanoparticles might be used for data storage or light emitting devices or even new kinds of logic circuits.The realization of these examples depends on an understanding of the deposition process in order to control the microscopic arrangement of the particles on the substrate surface.In all cases the nanoparticles have to be guided from the random distribution in the gas phase onto a flat substrate surface.In most cases the area of deposition is exactly specified,which means that the deposition process has to become selective.Additionally,depending on the application,the particles have to be arranged in films,lines or have to be positioned individually.