Mitsui Chem Developing Immersion Lithography Liquid Recycling System

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Mitsui Chem Developing Immersion Lithography Liquid Recycling System

机译：三井化学开发浸没式光刻液体回收系统

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Mitsui Chemicals is planning to develop a recycling system for a high-refractive-index organic liquid used in immersion lithography to manufacture new-generation semiconductors.

机译：三井化学正计划开发一种用于浸没式光刻的高折射率有机液体的回收系统，以制造新一代半导体。

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《Japan Chemical Week》 |2006年第2394期|共1页
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中图分类化学工业;
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1. Mitsui Chem Developing Immersion Lithography Liquid Recycling System [J] . Japan Chemical Week Group Japan Chemical Week . 2006,第2394期

机译：三井化学开发浸没式光刻液体回收系统
2. Numerical Analyses of the Roles of Gas Phase and Liquid Phase UV Photochemistry in Conventional and Immersion 193 nm Lithography [J] . William Hinsberg, Frances A.Houle Journal of Photopolymer Science and Technology . 2006,第5期

机译：气相和液相UV光化学在常规和浸没式193 nm平版印刷中的作用的数值分析
3. Numeric analysis of the role of liquid phase ultraviolet photochemistry in 193 nm immersion lithography [J] . William Hinsberg, Frances Houle Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2005,第6期

机译：液相紫外光化学在193 nm浸没式光刻中的作用的数值分析
4. Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography [C] . Robert J. LeSuer, Frank F. Fan, Allen J. Bard, Advances in Resist Technology and Processing XXI pt.1 . 2004

机译：在化学放大浸没式光刻中使用扫描电化学显微镜在固液界面处探测化学
5. Developing three-dimensional lithography and chemical lithography for applications on micro/nano photonics and electronics. [D] . Yao, Peng. 2007

机译：开发用于微/纳米光子学和电子学的三维光刻和化学光刻。
6. Comparative evaluation of dimensional stability of impression materials from developing countries and developed countries after disinfection with different immersion disinfectant systems and ultraviolet chamber [O] . Rupandeep Kaur Samra, Shreenivas Vasant Bhide 2018

机译：发展中国家和发达国家使用不同的浸入式消毒剂系统和紫外线消毒箱消毒后的印模材料的尺寸稳定性比较评估
7. Effects of Structural Parameters on Liquid Flowing in Immersion Lithography [O] . Liang ZHENG, Yu CHEN 2019

机译：结构参数对浸入光刻流动的影响

Mitsui Chem Developing Immersion Lithography Liquid Recycling System

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