JSR to Mass-produce ArF Immersion Lithography Liquid

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JSR to Mass-produce ArF Immersion Lithography Liquid

机译：JSR将大量生产ArF浸没式光刻液体

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JSR plans to build in 2006 a mass-production facility for an organic liquid to be used in argon-fluoride (ArF) immersion lithography,a key technique for a next-generation process to manufacture semiconductors.The Tokyo-based firm also plans to develop a recycling process for the product in order to make it eco-friendly.

机译：总部位于东京的JSR计划在2006年建立大规模生产设施，以用于氟化氩（ArF）浸没式光刻的有机液体，这是下一代制造半导体工艺的关键技术。产品的回收过程，以使其环保。

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《Japan Chemical Week 》 |2005年第2328期| 共1页
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1. JSR to Mass-produce ArF Immersion Lithography Liquid [J] . Japan Chemical Week Group Japan Chemical Week . 2005 ,第2328期

机译：JSR将大量生产ArF浸没式光刻液体
2. Full field analysis of lithography performance for ArF immersion lithography [J] . Yanqiu Li, Guosheng Huang Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2005 ,第6期

机译：用于ArF浸没式光刻的光刻性能的全场分析
3. Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm [J] . M. Letz, K. Knapp Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004 ,第4期

机译：使用水作为浸没液的液体浸没光刻：取向对193 nm处的光散射的作用
4. Understanding the Photoresist Surface-Liquid Interface for ArF Immersion Lithography [C] . Will Conley, Robert J. LeSuer, Frank F. Fan, Advances in Resist Technology and Processing XXII pt.1 . 2005

机译：了解ArF浸没光刻的光刻胶表面-液体界面
5. Investigating the p53-mdm2-ARF signaling circuit: Repression of ARF by the p53 tumor suppressor protein, oncogene activation of ARF, and detection of p53 activity in living cells [D] . Walsh, Christine A. 2006

机译：研究p53-mdm2-ARF信号回路：p53抑癌蛋白抑制ARF，ARF的癌基因激活以及活细胞中p53活性的检测
6. Solvent immersion imprint lithography: A high-performance semi-automated procedure [O] . S. H. Nemati, D. A. Liyu, A. J. Canul, 2017

机译：溶剂浸渍压印光刻：高性能半自动程序
7. Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45nm node [O] . Qiongyan Yuan, Xiangzhao Wang, Zicheng Qiu 2009

机译：偏振照明对45nm节点ArF浸没光刻法中高NA成像的影响
8. Acid-Catalyzed Single-Layer Resists for ArF Lithography [R] . Kunz, R. R. 1993

机译：用于arF光刻的酸催化单层抗蚀剂

JSR to Mass-produce ArF Immersion Lithography Liquid

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